Graphene Patterning via Photolithography

Abstract

We present a proof of concept to scale graphene based device fabrication combining Liquid Phase Exfoliated (LPE) method for the production of graphene flakes and standard photolithography for patterning high-resolution areas of graphene films (film widths down to 0.5 μm). The subsequent silver electrodes are created to test the patterned graphene films towards low NO2 concentrations at room temperature. The results prove that the combination of LPE method and standard photolithography could be a powerful strategy for building high-performance graphene based device with low cost and in large-scale.