Abstract
Annealing or processing of AlAs that has been subjected to a wet thermal oxidation process can result in severe delamination of material at the oxidation front. This paper reports a procedure for preventing this delamination and presents a possible cause for the delamination.
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APA
Hobbs, L., Eddie, I., Erwin, G., Bryce, A. C., De La Rue, R. M., Roberts, J. S., … Mackenzie, M. (2005). Reprocessing of thermally oxidized aluminum arsenide (AlAs) in epitaxial multilayers without delamination. Journal of Electronic Materials, 34(3), 232–239. https://doi.org/10.1007/s11664-005-0209-z
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