Herein we present a novel polyether(meth)acrylate-based resin material for stereolithography and other photolithographic applications with outstanding flexible material characteristics. This group of photopolymeric resin products combines the advantages of a non-toxic (meth)acrylate-based process material with a broad spectrum of adjustable low Young's modulus material characteristics. In contrast to the mostly rigid and non-flexible process materials used at the moment in the engineering world, these formulations are able to fulfil the extended need for a very flexible and also biocompatible engineering material, especially for three-dimensional models or prototypes in the medical technology area. A short overview over the bandwidth of possible material characteristics is given in this publication.
CITATION STYLE
Bens, A. T., Tille, C., Bermes, G., Emons, M., & Seitz, H. (2005). Novel, biocompatible polyether(meth)acrylate-based formulations for stereolithography - A new flexible material class for three-dimensional applications. E-Polymers. https://doi.org/10.1515/epoly.2005.5.1.377
Mendeley helps you to discover research relevant for your work.