Temperature dependence of laser-induced damage threshold in silica glass

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Abstract

The laser-induced damage thresholds in silica glasses at different temperature conditions (123 K - 473 K) by Nd:YAG laser fundamental (wavelength 1064 nm) and third harmonic (wavelength 355 nm) 4 ns of pulses were measured. In the results, the damage thresholds increased at low temperature. At 1064 nm, the temperature dependence became strong by the concentration of impurities. However, at 355 nm, the temperature dependences of almost sample were almost the same for different concentration of impurities. © 2010 IOP Publishing Ltd.

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CITATION STYLE

APA

Mikami, K., Motokoshi, S., Fujita, M., Jitsuno, T., Kawanaka, J., & Yasuhara, R. (2010). Temperature dependence of laser-induced damage threshold in silica glass. In Journal of Physics: Conference Series (Vol. 244). Institute of Physics Publishing. https://doi.org/10.1088/1742-6596/244/3/032023

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