Co(112̄0) epitaxial thin films with hcp structure were prepared on MgO(100) single-crystal substrates heated at 300 °C by ultra high vacuum molecular beam epitaxy. The microstructure is investigated by employing X-ray diffraction and high-resolution transmission electron microscopy. The film consists of two types of domains whose c-axes are rotated around the film normal by 90° each other. Stacking faults are observed for the film along the Co[0001] direction. An atomically sharp boundary is recognized between the film and the substrate, where some misfit dislocations are introduced in the film at the Co/MgO interface. Dislocations are also observed in the film up to 15 nm thickness from the interface. Presence of such stacking faults and misfit dislocations seem to relieve the strain caused by the lattice mismatch between the film and the substrate. X-ray diffraction analysis indicates that the out-of-plane and the in-plane lattice spacings of the film are in agreement within 0.5% and 0.1%, respectively, with those of the bulk hcp-Co crystal, suggesting the strain in the film is very small. © 2010 IOP Publishing Ltd.
CITATION STYLE
Nukaga, Y., Ohtake, M., Kirino, F., & Futamoto, M. (2010). Microstructure of Co(112̄0) epitaxial thin films, grown on MgO(100) single-crystal substrates. In Journal of Physics: Conference Series (Vol. 200). Institute of Physics Publishing. https://doi.org/10.1088/1742-6596/200/7/072071
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