Fabrication of superhydrophobic and UV-Resistant silk fabrics with laundering durability and chemical stabilities

Abstract

To obtain a superhydrophobic surface, SiO2 nanoparticles are deposited on the surface of silk fabric (SF) by Plasma Enhanced Chemical Vapor Deposition (PECVD) to form a hierarchical roughness structure. In addition, a durable superhydrophobic SiO2@silk fabric was further prepared by hexamethyldisilazane (HMDS) modification. Compared with bare silk, the surfaces of the SiO2@silk fabric exhibit higher surface roughness and excellent superhydrophobic activity, with a contact angle (CA) of ~152°. The excellent UV resistance of SiO2@silk fabric was confirmed with high UV protection factor (UPF) values and a low UV transmittance. Moreover, both the laundering durability and chemical stability of the SiO2@silk fabric were improved. Overall, this method is recognized as a promising approach to produce high-end fabric development. It can also guide the design of multifunctional fiber materials in the future.