Abstract
The paper describes traceable nanometrology based on a nanopositioning machine with integrated nanoprobes. The operation of the high-precision nanomeasuring machine having a resolution of 0,1 nm over the range of 25 mm x 25 mm x 5 mm is explained. Single beam-, double beam- and triple beam interferometer arranged with an Abbe offset-free design are installed into the nanomeasuring machine in order to measure and control the six degrees of freedom. The high performance of the machine is described with a metrological analysis. This analysis shows some todays limits of nanopositioning and nanomeasuring engineering. © Springer-Verlag Berlin Heidelberg 2009.
Cite
CITATION STYLE
Jäger, G., Manske, E., Hausotte, T., & Büchner, H. J. (2009). Nanomeasuring and nanopositioning engineering. In Fringe 2009 - 6th International Workshop on Advanced Optical Metrology (pp. 390–397). Springer Science and Business Media Deutschland GmbH. https://doi.org/10.1007/978-3-642-03051-2_64
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