Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology

22Citations
Citations of this article
31Readers
Mendeley users who have this article in their library.

Abstract

A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectively. Optimization of physiochemical parameters for biosorption of chromium and tannic acid degradation was carried out by Plackett–Burman design followed by response surface methodology (RSM). The maximum chromium removal and tannic acid degradation was found to be 92 and 68% respectively by A. niveus. Chromium removal and tannic acid degradation was increased up to 11 and 6% respectively after optimization. Scanning electron microscopy (SEM) and Fourier transform infrared spectroscopy (FTIR) was used to investigate biosorption phenomena.

Cite

CITATION STYLE

APA

Chaudhary, P., Chhokar, V., Choudhary, P., Kumar, A., & Beniwal, V. (2017). Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology. AMB Express, 7(1). https://doi.org/10.1186/s13568-017-0504-0

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free