Silicon nanocrystals (Si-NCs) were grown in situ in carbide-based film using a plasmaenhanced chemical vapor deposition method. High-resolution transmission electron microscopy indicates that these nanocrystallites were embedded in an amorphous silicon carbide-based matrix. Electron diffraction pattern analyses revealed that the crystallites have a hexagonal-wurtzite silicon phase structure. The peak position of the photoluminescence can be controlled within a wavelength of 500 to 650 nm by adjusting the flow rate of the silane gas. We suggest that this phenomenon is attributed to the quantum confinement effect of hexagonal Si-NCs in silicon carbide-based film with a change in the sizes and emission states of the NCs. © 2012 Kim et al.
CITATION STYLE
Kim, T. Y., Huh, C., Park, N. M., Choi, C. J., & Suemitsu, M. (2012). In situ-grown hexagonal silicon nanocrystals in silicon carbide-based films. Nanoscale Research Letters, 7. https://doi.org/10.1186/1556-276X-7-634
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