Integrated nanotechnology based on MEMS

Abstract

In this chapter, after a brief review of integrated silicon-based MEMS fabrication techniques, MEMS techniques for nano-metric fabrication is emphasized. Using high selectivity and anisotropy of specific top-down micromachining methods, nanometric feature size can be fabricated for NEMS applications. Fabrication techniques of typical MEMS-made NEMS structures, such as nanotips, nanoapertures, nano junction, nanolines and nano-beams, are detailed in the chapter. Then, by integrating the nanoscale feature structure with the micrometric main body, typical integrated NEMS devices and their applications are addressed. The chapter also relates key size-effects of the integrated nanomechanical structures that have shown significant difference in electromechanical properties compared to their microscale counterparts, like the big difference in silicon Young's modulus value. At last, the bright future of the integrated NEMS techniques and devices are outlooked.