Advanced AlGaN/GaN Resonant Tunneling Diode on Silicon Substrate for Negligible Scattering and Polarization effects

Abstract

In this work we have proposed an advanced AlGaN/GaN resonant tunneling diode (RTD) structure on silicon substrate which introduces modulation doped emitter collector regions and graded spacer layers. An analytical model has been presented to predict the variation of transmission coefficient (Tc) with different scattering phenomena. The physical interpretations of this structure define negligible scattering effects and polarization induced field. Simulated results show an improved current voltage (I-V) characteristics as well as high peak to valley current ratio (PVCR).