Particles as small as 0.3 μm in diameter have been successfully removed from a glass surface using a single ultraviolet pulse from a frequency doubled copper vapor laser (255.3 nm). Quantitative analysis of the particle density before and after laser irradiation shows that laser cleaning occurs after a fluence threshold is reached. The cleaning efficiency after threshold follows a nonlinear trend with respect to fluence. A model is presented which reveals that the cleaning efficiency is a function of the irradiance distribution of the beam used. Results of modeling thermal expansion of the substrate and particles, and particle adhesion do not confirm a thermal expansion mechanism for laser cleaning in this study, in contrast with other recent reports. © 1999 American Institute of Physics.
CITATION STYLE
Halfpenny, D. R., & Kane, D. M. (1999). A quantitative analysis of single pulse ultraviolet dry laser cleaning. Journal of Applied Physics, 86(12), 6641–6646. https://doi.org/10.1063/1.371737
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