Nanosphere lithography for the fabrication of ultranarrow graphene nanoribbons and on-chip bandgap tuning of graphene

Abstract

An innovative approach for the high-throughput, rapid, and low-cost fabrication of ultranarrow graphene nanoribbons (GNRs) using nanosphere lithography (NSL) nanopatterning in combination with low-power O2 plasma etching is presented. The intrinsic simplicity of NSL patterning enables this fabrication approach to be applicable for the straightforward on-chip fabrication of GNRs and bandgap tuning of graphene. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.