Nano-structuring of CaF2 surfaces by slow highly charged ions: Simulation and experiment

Abstract

The impact of individual slow highly charged ions (HCI) on insulators can create nano-scale surface modifications. We present recent experimental results on nano-hillock and etch pit formation on CaF2, where the appearance of surface modifications is observed only above a threshold projectile potential and kinetic energy depending on the type of damage. A proof-of-principle molecular dynamics simulation offers insights into the early stages of damage formation.