BULK SILICAS PREPARED BY LOW PRESSURE PLASMA CVD: FORMATION OF STRUCTURE AND POINT DEFECTS

Golant, K. M. (2000). BULK SILICAS PREPARED BY LOW PRESSURE PLASMA CVD: FORMATION OF STRUCTURE AND POINT DEFECTS. In Defects in SiO2 and Related Dielectrics: Science and Technology (pp. 427–452). Springer Netherlands. https://doi.org/10.1007/978-94-010-0944-7_15