Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Abstract

Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted atomic layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temperature and a good WVTR of 5 × 10-3 g m-2 day-1 (WVTR PEN=0.5 g m-2day-1) was measured for a 20 nm thick Al2O3 film deposited at room temperature using short purging times. Such ultrathin, low-temperature deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications. © 2006 American Institute of Physics.