SPL by Electric-Field- Enhanced Oxidation

Abstract

SPL by electric-field-enhanced oxidation was introduced by Dagata [5] in his pioneering study of patterning hydrogen passivated <111> single crystal silicon with the scanning tunneling microscope (STM). The lithography begins by removing the native oxide and hydrogen passivating the silicon surface in hydroflouric acid (HF). Then the tip of a scanning probe with a voltage bias (typically a few volts) is brought to the vicinity of the surface creating an intense electric field. The magnitude of this electric field can be in excess of 1 V/nm. A schematic diagram of the experimental set up is shown in Fig. 2.1.