Abstract
Microcrystals and microcrystalline films of diamond were prepared on molybdenum substrates in a thermal plasma which was produced by rf inductive heating in an argon-hydrogen-methane mixture gas under 1 atm pressure. The deposition rate amounted to 1 μm/min.
Cite
CITATION STYLE
APA
Matsumoto, S., Hino, M., & Kobayashi, T. (1987). Synthesis of diamond films in a rf induction thermal plasma. Applied Physics Letters, 51(10), 737–739. https://doi.org/10.1063/1.98851
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