Vacuum coating system for deposition of superconducting W x Si(1-x) ultrathin films used in single photon detectors

Abstract

VUP-11M coating system for thin films deposition in vacuum is described in this article. Technological features which appear at laboratory vacuum system modernization for implementation of dual-components W x Si(1-x) films forming process by means of magnetron co-sputtering from two sources are shown. Totals of the system modernization and research results of obtained W x Si(1-x) films are reported.