EUV light source by high power laser

Abstract

In the development of a high power EUV source used in the EUV lithography system, it is important to understand basic physics of EUV plasma and to optimize laser and target conditions. We have been constructed EUV database of laser-produced tin plasma by the theoretical and experimental studies. On the basis of our understanding, the optimum conditions of lasers and plasmas were clarified, and we proposed the guidelines of laser plasma to obtain clean, efficient and high power EUV source for the practical EUV lithography system. In parallel to such studies, novel targets and high power laser system to generate the optimized EUV source plasma have been developed. Recent progresses of our program are presented.