Abstract
This chapter presents an overview of Atomic Force Microscopy (AFM) principles followed by details on AFM instrumentation. In particular, the frequency modulation method of the non-contact AFM (NC-AFM) used in ultra-high vacuum conditions is explained in detail. Then, applications of NC-AFM for an atomic-scale range characterization of semiconductor and isolator surfaces as well as supported nanostructures are introduced. © Springer-Verlag Berlin Heidelberg 2013.
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CITATION STYLE
Krok, F., Such, B., Kolodziej, J. J., & Szymonski, M. (2013). Atomic force microscopy for surface imaging and characterization of supported nanostructures. Springer Series in Surface Sciences, 51(1), 621–653. https://doi.org/10.1007/978-3-642-34243-1_21
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