Iron-boron pair dissociation in silicon under strong illumination

Abstract

The dissociation of iron-boron pairs (FeB) in Czochralski silicon under strong illumination was investigated. It is found that the dissociation process shows a double exponential dependence on time. The first fast process is suggested to be caused by a positive Fe in FeB capturing two electrons and diffusion triggered by the electron-phonon interactions, while the second slow one would involve the capturing of one electron followed by temperature dependent dissociation with an activation energy of (0.21 ± 0.03) eV. The results are important for understanding and controlling the behavior of FeB in concentrator solar cells. © 2013 © 2013 Author(s).