Continuous Image Writer: a new approach to fast direct writing

Abstract

We report on the development of a production tool of a new system for fast submicron lithography by optical direct writing. The Continuous Image Writer (CIW) combines the advantages of direct writing by using a programmable mask with the advantages of conventional optical lithography by using the same lithographic processes for image formation in photoresists. The CIW can write faster than conventional direct writers and it is more flexible than wafersteppers or scanners. The CIW is designed for maskiess patterning of wafers and substrates down to O.6O.tm feature size. It reaches a maximum writing speed of 1 ,250mm2/min. Our system uses a Lambda Physik KrF excimer laser as light source. The CIW includes all the components necessary for the fully automated exposure of wafers or substrates including automated substrate handling and alignment.