Investigation of multilayer X-ray optics for the 6 keV to 20 keV energy range

Abstract

The X-ray optics group at the Swiss Light Source in co-operation with RIT (Rigaku Innovative Technologies) have investigated seven different multilayer samples. The goal was to find an ideal multilayer structure for the energy range between 6 keV and 20 keV in terms of energy resolution and reflectivity. Such multilayer structures deposited on substrates can be used as X-ray monochromators or reflecting synchrotron mirrors. The measured reflectivities agree with the simulated ones. They cover a reflectivity range from 45% to 80% for energies between 6 keV and 10 keV, and 80% to 90% for energies between 10 keV and 20 keV. The experimentally measured energy resolution of the samples lies between 0.3% and 3.5%. © 2012 International Union of Crystallography Printed in Singapore - all rights reserved.