Alternate pattern fill

0Citations
Citations of this article
3Readers
Mendeley users who have this article in their library.
Get full text

Abstract

An algorithm for alternate pattern fill on arbitrary line segments, circular arcs and elliptical arcs is proposed in this paper. The algorithm creates an external loop which is a minimal loop that contains a given point. And then, all loops that delimit the nested regions for the alternate pattern fill inside the external loop are built. The loop detection is based on a new method for searching the leftmost edges. It requires only values of positions, tangent vectors, curvature radii, and the first derivatives of curvature radii at intersection points and areas of circles and ellipses. After all necessary loops are built, the given pattern is filled in the nested loops inside the external loop. Filling the given pattern in this paper is simplified into filling line segment patterns on some parallel lines. © Springer-Verlag 2004.

Cite

CITATION STYLE

APA

Zhang, X. X., Yong, J. H., Gong, L. H., Zheng, G. Q., & Sun, J. G. (2004). Alternate pattern fill. Lecture Notes in Computer Science (Including Subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics), 3314, 1127–1133. https://doi.org/10.1007/978-3-540-30497-5_173

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free