Template Transfer Nanoimprint for Uniform Nanopores and Nanopoles

Abstract

A new methodology is developed for the fabrication of nanostructures on substrate based on anodized Al2O3 (AAO) porous template transfer process. It includes (1) forming amorphous alloy, negative UV-resist resin (i.e., SU-8), or PMMA (polymethylmethacrylate) plate nanorod arrays by hot-press molding amorphous alloy, negative UV-resist resin (i.e., SU-8), or PMMA plate into the anodized Al2O3 porous substrates; (2) removing AAO templates by chemical etching process after suitable posttreatment (annealing and/or irradiation) to improve the mechanical strength of the nanorod arrays; (3) reforming nanopore films by hot-embossing the nanorod arrays into a thin layer of polymer film on substrates (e.g., silica); (4) cleaning the bottom residues in pores of the films by oxygen plasmon. The results indicate that the diameters of amorphous alloy (or negative UV-resist resin or PMMA) nanorod arrays can be ranged from 32 nm to 200 nm. The diameters of the imprinted ILR-1050 photoresist nanopores are about 94.5 ± 12.2 nm and the diameters of the imprinted or SU-8 resin on glass slides nanopores are about 207 ± 26.4 nm, which inherit the diameters of AAO templates. This methodology provides a general method to fabricate nanorods arrays and/or thin nanopore films by template transfer nanoimprint process.