Continuous deposition system of SnO2 thin film by the Liquid Phase Deposition (LPD) method

Abstract

SnO2 thin film was prepared from a SnF2-HF aqueous solution with the addition of H3BO3 aqueous solution by the Liquid Phase Deposition (LPD) method. We focused on the construction of the continuous deposition system and the control of the deposition rate. Parent solution containing SnF2-HF was intermittently added to the treatment solution, which consists of the excess amount of H3BO3. As a result, the deposition rate can be maintained almost constant, at least for 24 h, and uniform SnO2 film with the thickness of more than 600 nm was obtained.