DEPOSITION EQUIPMENT.

Abstract

Deposition of semiconductor thin films is accomplished by a wide variety of techniques ranging from physical processes such as sputter deposition to chemical processes such as chemical vapor deposition. There is a commonality, however, in terms of the desired quality of the resulting thin film. Three areas of concern with respect to film quality are uniformity, coverage and contamination or purity. As with all semiconductor fabrication equipment, the tendency is toward more automation. Photochemical deposition and epitaxial film growth systems are described.