Development of a Process for Cleaning a TEM Column by Chemical Etching of Oxygen Radicals

Horiuchi, S., Hanada, T., & Ebisawa, M. (2009). Development of a Process for Cleaning a TEM Column by Chemical Etching of Oxygen Radicals. In EMC 2008 14th European Microscopy Congress 1–5 September 2008, Aachen, Germany (pp. 387–388). Springer Berlin Heidelberg. https://doi.org/10.1007/978-3-540-85156-1_194