IR spectra of ICPCVD SiNx thin films for MEMS structures

Abstract

Optical properties of non-stoichiometric silicon nitride (SiNx) films for thermo sensitive membranes of microelectromechanical systems (MEMS) and microoptomechanical systems (MOMS) has been studied applying infrared (IR) spectroscopy. For the structures SiNx/Si and (thin metal layer)/SiNx/Si transmission and reflection spectra in the region of wave numbers of 500-7000 cm-1 has been investigated. For the investigated structures analysis of optical properties observed in the IR spectra both in the form of selective absorption bands and interference modulation of a baseline was conducted.