Silicon-nitride-passivated bottom-up single-electron transistors

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Abstract

We report the elaboration of SiNx-passivated chemically assembled single-electron transistors (SETs) by bottom-up processes involving electroless Au plating and the chemisorption of Au nanoparticles. With a Au top-gate electrode, the SiNx-passivated SETs showed a clear Coulomb diamond at 9 K and the top-gate capacitance was 17 times larger than the side-gate capacitance. Moreover, Coulomb oscillation and the Coulomb diamond were observed even at 160 K. Thus, planar technology is applicable to chemically assembled SETs. © 2013 The Japan Society of Applied Physics.

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Hackenberger, G., Azuma, Y., Kano, S., Tanaka, D., Sakamoto, M., Teranishi, T., … Majima, Y. (2013). Silicon-nitride-passivated bottom-up single-electron transistors. Japanese Journal of Applied Physics, 52(11 PART 1). https://doi.org/10.7567/JJAP.52.110101

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