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Tuning plasmonic properties of CuS thin films via valence band filling

RSC Advances (2017) 7(18) 11118-11122
DOI: 10.1039/c6ra27076j
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Abstract

In this study, we propose an interesting strategy for tuning the localized surface plasmon resonance (LSPR) of CuS thin films by filling the vacancies in the valence band by electrochemical reduction under acidic conditions leading to the decrease in free carrier concentration yielding CuS thin films with different LSPR properties.

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CITATION STYLE

APA

Kalanur, S. S., & Seo, H. (2017). Tuning plasmonic properties of CuS thin films via valence band filling. RSC Advances, 7(18), 11118–11122. https://doi.org/10.1039/c6ra27076j

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