Higher Operating Temperature IR Detectors of the MOCVD Grown HgCdTe Heterostructures

Abstract

This paper summarizes progress in metal organic chemical vapour deposition (MOCVD) technology achieved in recent years at the Institute of Applied Physics, Military University of Technology and VIGO System S.A. MOCVD with a wide range of composition and donor/acceptor doping and without post-growth annealing is a very convenient tool for the deposition of HgCdTe epilayers used for uncooled infrared detectors. Particular attention is focused on: surface morphology improvement, doping issues, diffusion processes during growth study, substrate issues, crystallographic orientation selection. In this respect, MOCVD technology improvement influencing IR detector parameters is shown. CdTe buffer layer deposition allows HgCdTe heterostructure growth on GaAs substrates. Theoretical modelling using APSYS platform supports designing and better understanding of the carrier transport mechanism in detector’s structures. Secondary ion mass spectrometry profiles allows to compare projected and obtained structures and revealed diffusion processes of the elements. A wide range of different types of infrared detectors operating at high operating temperature conditions has been constructed: photoresistors, non-equilibrium photodiodes, dual-band photodiodes, barrier and multiple detectors. The methodical research efforts contributed to the time constant reduction are important in many detector applications. Future challenges and prospects are also discussed.