Development of multipurpose laboratory XIEES spectrometer and its application to surface XAFS analysis of Al2O3 films

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Abstract

A new laboratory spectrometer for X-ray Induced Electron Emission Spectroscopy (XIEES) has been developed. This spectrometer is suitable for measurements of X-ray Absorption Fine Structure (XAFS) spectrum in surface sensitive fluorescence and electron emission detection modes as well as in standard transmission mode. It is the advantage of this spectrometer that a wide range of x-ray energy scanning between 0.48 and 41 keV is available At the Cu K-edge, a energy resolution of about 2 eV has been achieved. The spectrometer has been used to analyze the Al2O3 (40 Å and 500 Å)/Si(100) with total electron yield measurement.

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Lee, J. C., Song, S. A., Yuryev, Y., Terada, Y., Nakai, I., & Lim, C. B. (2001). Development of multipurpose laboratory XIEES spectrometer and its application to surface XAFS analysis of Al2O3 films. Journal of Synchrotron Radiation, 8(2), 360–362. https://doi.org/10.1107/S0909049500014266

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