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Block polymers for self-assembling: Lithographic materials

Springer Japan, (2015), 975-1010
DOI: 10.1007/978-4-431-54186-8_22
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Abstract

This chapter reviews the recent progress made in the application of block polymers for self-assembling lithographic materials. It specifically focuses on polyhedral oligomeric silsesquioxane (POSS)-containing block copolymers prepared by living anionic polymerization and their self-assembled nanostructures. Special emphasis is laid on our own research with regard to the control of morphologies and directed self-assembly.

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Hayakawa, T. (2015). Block polymers for self-assembling: Lithographic materials. In Anionic Polymerization: Principles, Practice, Strength, Consequences and Applications (pp. 975–1010). Springer Japan. https://doi.org/10.1007/978-4-431-54186-8_22

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