Semiconductor lithography is the patterning process used to define the structures that make up integrated circuits (ICs). The semiconductor industry has historically scaled down the size of printed features on ICs because scaling both improves transistor performance and reduces the area that devices occupy. Today the patterning technology employed in manufacturing is photolithography, a process that uses ultraviolet light to define submicron-sized features in photosensitive polymers. Since photolithography is rapidly approaching fundamental resolution limitations, a new high-resolution patterning technique may be required to continue the industry's trend toward higher performance electron devices, increased packing densities, and higher density memories.
CITATION STYLE
Soh, H. T., Guarini, K. W., & Quate, C. F. (2001). Introduction to Scanning Probe Lithography (pp. 1–22). https://doi.org/10.1007/978-1-4757-3331-0_1
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