Photoresist-derived porous carbon for integrated on-chip energy storage

Abstract

We have developed a facile, and scalable fabrication process for high surface area porous carbon for microsupercapacitor applications. A porous carbon film is synthesized by pyrolysis of commercial SPR-220 photoresist in an H2/Ar mixture and tested for specific capacitance. A capacitance of about 2 mF/cm2 was achieved, matching or exceeding numerous other proposed microsupercapacitor technologies. The material was also demonstrated to be robust under cycling in aqueous electrolyte, retaining > 92% of its original capacitance after 106 cycles.