Optimized soft lithography method for polymer cholesteric liquid crystal flakes fabrication

Abstract

Polymer cholesteric liquid crystal (PCLC) flakes are gaining increasing interest for a wide variety of applications because of their unique optical properties and capabilities. Soft lithography is the most effective way to fabricate regularly shaped PCLC flakes. However, it is not easy to peel the flakes from the mold without breaking them. In order to peel the PCLC flakes from the patterned polydimethylsiloxane (PDMS) mold in a convenient way, in this paper, a method of coating a layer of polyvinyl alcohol (PVA) on a PDMS mold was proposed. The influence of the thickness of the PVA layer on the shape of the PCLC flakes and the release time from the PDMS mold were investigated. The results show that the presence of the PVA layer can speed up the release of the PCLC flakes and help maintain the shape effectively. Notably, the utilization of a PVA layer makes the PDMS mold recyclable. The influence of PCLC flake shape was also studied. This work will promote the development of switchable PCLC flake-based technologies.