Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded-index nanostructures for broadband optical antireflection enhancement including the near-ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with silicon nano-conical-frustum arrays. This is a feasible optimized integration method of two major approaches for antireflective surfaces: quarter-wavelength AR coating and biomimetic moth's eye structure. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
CITATION STYLE
Park, H., Shin, D., Kang, G., Baek, S., Kim, K., & Padilla, W. J. (2011). Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays. Advanced Materials, 23(48), 5796–5800. https://doi.org/10.1002/adma.201103399
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