Stitching interferometric measurement system for hard X-ray nanofocusing mirrors

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Abstract

We have developed an advanced type of relative angle determinable stitching interferometry (RADSI) for hard X-ray nanofocusing mirrors. The surface metrology system consists of two types of optical interferometers. One is a microscope Michelson interferometer, which measures the local figure profile of the mirror surface, and the other is a large-area Fizeau interferometer, which determines the stitching angles between neighboring shots using a flat mirror. The surface figure profile of each of the one-shots and the stitching angles are measured at the same time. Precise measurement of local surface area and the stitching angles of 1×10-8 rad order were achieved using the developed system. To demonstrate the accuracy of the developed measurement system, we measured an elliptically figured mirror for hard X-ray nanofocusing. The mirror's surface shape has a curvature radius of a few meters. As a result, measurement reproducibility and reliability of less than PV 3 nm was achieved by using a 25 nm focusing mirror. © 2009 IOP Publishing Ltd.

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APA

Yumoto, H., Mimura, H., Handa, S., Kimura, T., Matsuyama, S., Sano, Y., … Yamauchi, K. (2009). Stitching interferometric measurement system for hard X-ray nanofocusing mirrors. In Journal of Physics: Conference Series (Vol. 186). https://doi.org/10.1088/1742-6596/186/1/012080

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