Growth of TiN thin film on Al 5083 deposited using dc sputtering technique for improving their hardness and corrosion resistance

Abstract

Aluminium 5083 is an Al-Mg alloy commonly used in ship hull construction. Although it has good corrosion resistance, this aluminium alloy is susceptible to corrosion in extreme environments for a long time. This research aims is to improve the ability of aluminium 5083 deposited by TiN to increase hardness and corrosion resistance using dc sputtering process. This research was carried out with several processes, namely the study of literature, preparation of tools and materials, manufacturing of test objects, coating process, characterization, data analysis, and report making. Hardness testing was done by Vickers method, corrosion testing was carried out by electrochemical method, and crystal structure test using diffraction X-ray. The results of this study were sputtering time 120 minutes increasing hardness 81.6% or becoming 94.7 VHN. The best corrosion rate at 90 minutes sputtering time is 0.0001 mpy. The formation of the TiN phase in the direction of 111, 200, and 202 planes respectively, was shown through peaks at 2-theta at 36.68°, 42.72° and 61.98°.