Carbon p Electron Ferromagnetism in Silicon Carbide

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Abstract

Ferromagnetism can occur in wide-band gap semiconductors as well as in carbon-based materials when specific defects are introduced. It is thus desirable to establish a direct relation between the defects and the resulting ferromagnetism. Here, we contribute to revealing the origin of defect-induced ferromagnetism using SiC as a prototypical example. We show that the long-range ferromagnetic coupling can be attributed to the p electrons of the nearest-neighbor carbon atoms around the V SiVC divacancies. Thus, the ferromagnetism is traced down to its microscopic electronic origin.

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Wang, Y., Liu, Y., Wang, G., Anwand, W., Jenkins, C. A., Arenholz, E., … Zhou, S. (2015). Carbon p Electron Ferromagnetism in Silicon Carbide. Scientific Reports, 5. https://doi.org/10.1038/srep08999

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