X-ray photoelectron spectroscopy study of (NH4)2Sx-treated Mg-doped GaN layers

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Abstract

We present here the passivation mechanism and the chemistry of an (NH4)2Sx-treated Mg-doped GaN surface examined by using x-ray photoelectron spectroscopy. The native oxide on the GaN surface can be removed by the (NH4)2Sx treatment process. The S atoms not only bond as elemental sulfur and disulfides, but occupy nitrogen-related vacancies. © 2000 American Institute of Physics.

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Lin, Y. J., Tsai, C. D., Lyu, Y. T., & Lee, C. T. (2000). X-ray photoelectron spectroscopy study of (NH4)2Sx-treated Mg-doped GaN layers. Applied Physics Letters, 77(5), 687–689. https://doi.org/10.1063/1.127086

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