Capacitance characterization of AIN/GaN double-barrier resonant tunnelling diodes

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Abstract

We report on the electrical characterization of AlN/GaN/AlN double-barrier resonant tunnelling diodes (RTDs) using steady-state current-voltage and capacitance-voltage (C-V) characteristics in a wide frequency range with 2 kHz steps. The C-V characteristics of a double-barrier RTD show different behaviour under forward and reverse polarities and a strong dependence on frequency. The monotonous growth of capacitance at forward bias was registered, while a more complicated dependence was observed at reverse voltages. In order to analyse this dependence, a self-consistent calculation of the potential profile of the structure was performed taking into account polarization effects at the AlN/GaN interfaces. The peculiarities are analysed in the model of possible charge trapping at the interface states. © 2006 WILEY-VCH Verlag GmbH & Co. KGaA.

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Kurakin, A. M., Vitusevich, S. A., Danylyuk, S. V., Naumov, A. V., Foxon, C. T., Novikov, S. V., … Belyaev, A. E. (2006). Capacitance characterization of AIN/GaN double-barrier resonant tunnelling diodes. In Physica Status Solidi (C) Current Topics in Solid State Physics (Vol. 3, pp. 2265–2269). https://doi.org/10.1002/pssc.200565156

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