Spin coating is a batch process in which a liquid film is spread by centrifugal force onto a rotating substrate. A typical spin-coating system for microelectronic wafers is shown in Fig. 14.1. At high rotation speeds, around 1000 to 10 000 rpm, such devices spin...
CITATION STYLE
Larson, R. G., & Rehg, T. J. (1997). Spin Coating. In Liquid Film Coating (pp. 709–734). Springer Netherlands. https://doi.org/10.1007/978-94-011-5342-3_20
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