Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions

  • Rönnby K
  • Pedersen H
  • Ojamäe L
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Abstract

Kinetic modeling has been used to study the decomposition chemistry of ammonia at a wide range of temperatures, pressures, concentrations, and carrier gases mimicking the conditions in chemical vapor deposition (CVD) of metal nitrides. The modeling shows that only a small fraction of the ammonia molecules will decompose at most conditions studied. This suggests that the fact that the high NH3 to metal ratios often employed in CVD is due to the very low amount of reactive decomposition products being formed rather than due to rapid decomposition of ammonia into stable dinitrogen and dihydrogen as suggested by purely thermodynamic equilibrium models.

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Rönnby, K., Pedersen, H., & Ojamäe, L. (2020). Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 38(5). https://doi.org/10.1116/6.0000369

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