Book ChapterOPEN ACCESS

A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication

  • Shih
InTech, (2012)
DOI: 10.5772/31992
N/ACitations
Citations of this article
27Readers
Mendeley users who have this article in their library.

Abstract

A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication.

Cite

CITATION STYLE

APA

Shih. (2012). A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication. In Corrosion Resistance. InTech. https://doi.org/10.5772/31992

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free