Evaluation of the Nanoimprinting Process Using Scanning Probe Microscopy (SPM)

Abstract

Nanoimprint lithography (NIL) is a technology that allows the fabrication of low-cost nanostructure devices at high throughput and accuracy. The most popular NIL method is ultraviolet (UV) nanoimprinting because it is a room-temperature process that does not require a thermal cycle. When demolding, the force required is the result of adhesion and friction between the antisticking layer and the resin, and a high demolding force produces pattern defects. Scanning probe microscopy (SPM) is a useful technique for evaluating the performance at the nanometer scale of both the antisticking layer and the UV-curable resin. In this chapter, we describe the evaluation, using techniques of scanning probe microscopy, of a number of properties of antisticking layers and UV-curable resins used in nanoimprint lithography.