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Fabrication of Metal-insulator-metal Capacitors with SiN x Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition

  • Wang C
  • Kim N
Transactions on Electrical and Electronic Materials (2009) 10(5) 147-151
DOI: 10.4313/teem.2009.10.5.147
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Abstract

... Fabrication of Metal - insulator - metal Capacitors with SiNx Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition Cong Wang* and Nam - Young Kim RFIC Center, Department of Electronic Engineering, Kwangwoon University, Seoul 139-701, Republic of Korea ...

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APA

Wang, C., & Kim, N.-Y. (2009). Fabrication of Metal-insulator-metal Capacitors with SiN x Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition. Transactions on Electrical and Electronic Materials, 10(5), 147–151. https://doi.org/10.4313/teem.2009.10.5.147

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