Comparative studies on Mo-Cr-N and A1-Cr-N coatings obtained by PVD dual magnetron sputtering

8Citations
Citations of this article
16Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

Recently, several studies have shown that the addition of a secondary element likes Al, Si, etc. to nitride and carbide binary systems such as Ti-N and Cr-N improved their structural and mechanical properties and also their thermal stability. In this study, we realized a comparison between the effects of aluminium or molybdenum addition on the properties of the Cr-N system. The (Cr,A1)N and (Cr,Mo)N films were deposited by RF dual magnetron sputtering. To control the aluminium and molybdenum contents in (Cr,A1)N and in (Cr,Mo)N films, respectively, we modified the Cr, Al and Mo target bias. The structural, morphological and composition analyses of the deposited films were carried out using X-ray diffraction (XRD) and SEM equipped with an energy dispersive spectroscopy (EDS) microanalysis. The variation of the residual stresses with the Al and Mo contents has been studied using the Newton's rings method. The obtained Al contents in (Cr,A1)N deposited films varied between 0 and 51 at.% while the Mo contents in (Cr,Mo)N layers varied between 0 and 42 at.%. A morphological change from amorphous to columnar films has been observed with the addition of Al in the case of (Cr,A1)N coatings, while all the (Cr,Mo)N films presented a columnar structure. The residual stresses of the (Cr,Mo)N coatings are higher than the (Cr,Al)N ones but they exhibited a similar behaviour for both coatings. © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Cite

CITATION STYLE

APA

Benlatreche, Y., Nouveau, C., Rahil, I., Marchai, R., & Chekour, L. (2009). Comparative studies on Mo-Cr-N and A1-Cr-N coatings obtained by PVD dual magnetron sputtering. In Plasma Processes and Polymers (Vol. 6). https://doi.org/10.1002/ppap.200930406

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free